Speaker: Dapeng Jing, Material Analysis and Research Laboratory, Iowa State University
Title: Capabilities of MARL XPS
Abstract:
X-ray photoelectron spectroscopy (XPS), is the most heavily used electron spectroscopy for surface analysis. XPS reveals the chemical nature of the elements (i.e., bonding state) as well as their relative abundance. It is particularly sensitive to the top few nanometers of the sample. In this presentation, an introduction on the basics of XPS is first presented with an emphasis on spectral understanding and interpretation. This part includes the XPS physics – photoelectric effect – and explains its surface sensitivity and the factors that influence the spectra, including initial and final state effects. The second part of this presentation briefly introduces the Kratos Amicus XPS unit focusing on its operation and the principles of its electron analyzer. Thirdly, data acquired using Amicus XPS is presented. This part aims to help understand the factors affecting practical spectral resolution and sensitivity. Routine XPS analysis procedures including curve-fitting methodologies, quantification are illustrated using case studies.